Expert Interview: Bruno La Fontaine

After decades of research and development, extreme ultraviolet (EUV) lithography has recently reached the point of high-volume semiconductor manufacturing, marking a significant technological breakthrough. Berkeley Lab’s Center for X-ray Optics (CXRO) has played an instrumental role in this achievement, working directly with chipmakers to develop tools to overcome longstanding challenges in EUV resist performance and mask defects. As EUV lithography advances to its next generation, CXRO – in close collaboration with the Advanced Light Source and the Center for High Precision Patterning Science (CHiPPS) – continues to address ongoing obstacles in optics, masks, and materials, enabling the creation of even smaller semiconductor features for future electronics.

Featuring: Bruno La Fontaine, director of the Center for X-Ray Optics (CXRO). He and his team develop unique research tools and perform scientific experiments that help the semiconductor industry make faster, smaller, and more efficient microchips.